Infrared Studies of Ar(H2)2 at Low Temperature and High Pressure

被引:0
|
作者
L. Ulivi
R. Bini
H. J. Jodl
P. Loubeyre
R. LeToullec
F. Datchi
机构
[1] IEQ,Laboratorio di Spettroscopia Molecolare, Dip. di Chimica
[2] Istituto di Elettronica Quantistica,Fachbereich Physik
[3] CNR,Physique des Milieux Consensés
[4] LENS,undefined
[5] Laboratorio di Spettroscopie non–Lineari,undefined
[6] Università di Firenze,undefined
[7] Universität,undefined
[8] Université P. et M. Curie,undefined
来源
关键词
Hydrogen; High Pressure; Magnetic Material; Infrared Absorption; Vibrational Band;
D O I
暂无
中图分类号
学科分类号
摘要
An extensive infrared absorption study of the compound Ar(H2)2in the range of pressure from 5 to 30 GPa, and between 30 K and room temperature is presented. This study has permitted the identification and assignment of high–frequency and low frequency vibron–phonon combination bands, as well as of the roto–vibrational bands. Spectra changes lowering temperature, with the appearance of the Q1(0) vibrational peak, are interpreted as arising from conversion of ortho–hydrogen into para–hydrogen in the solid.
引用
收藏
页码:703 / 708
页数:5
相关论文
共 50 条
  • [1] Infrared studies of Ar(H2)2 at low temperature and high pressure
    Ulivi, L
    Bini, R
    Jodl, HJ
    Loubeyre, P
    LeToullec, R
    Datchi, F
    JOURNAL OF LOW TEMPERATURE PHYSICS, 1998, 111 (3-4) : 703 - 708
  • [2] Extended spectroscopic studies of Ar(H2)2 at high pressure and low temperature
    Ulivi, L
    Bini, R
    Santoro, M
    PHYSICA B, 1999, 265 (1-4): : 39 - 48
  • [3] Extended spectroscopic studies of Ar(H2)2 at high pressure and low temperature
    Ulivi, Lorenzo
    Bini, Roberto
    Santoro, Mario
    Physica B: Condensed Matter, 1999, 265 (1-4): : 39 - 48
  • [4] Spectroscopic studies of the Ar(H2)2 compound crystal at high pressure and low temperatures
    Ulivi, L
    Bini, R
    Loubeyre, P
    LeToullec, R
    Jodl, HJ
    PHYSICAL REVIEW B, 1999, 60 (09): : 6502 - 6512
  • [5] Studies on the Surface of PTFE Membranes Treated with Atmospheric Pressure Low Temperature Plasma of Ar and Ar/H2
    Akashi, Naohisa
    Hosoi, Katsuhiko
    Kuroda, Shin-ichi
    ADVANCES IN TEXTILE ENGINEERING AND MATERIALS IV, 2014, 1048 : 440 - 443
  • [6] INFRARED STUDIES OF LOW-TEMPERATURE ADSORPTION OF H2 ON ZNO
    DENISENKO, LA
    TSYGANENKO, AA
    FILIMONOV, VN
    REACTION KINETICS AND CATALYSIS LETTERS, 1983, 22 (3-4): : 265 - 269
  • [7] Temperature of Particulates in Low-Pressure rf-Plasmas in Ar, Ar/H2 and Ar/N2 Mixtures
    Maurer, H. R.
    Basner, R.
    Kersten, H.
    CONTRIBUTIONS TO PLASMA PHYSICS, 2010, 50 (10) : 954 - 961
  • [8] High-pressure phase transition and metallization in Ar(H2)2
    Yao, Yansun
    Klug, Dennis D.
    PHYSICAL REVIEW B, 2011, 83 (02):
  • [9] Low-temperature crystallization of amorphous silicon by atmospheric-pressure plasma treatment in H2/He or H2/Ar mixture
    Ohmi, Hiromasa
    Kakiuchi, Hiroaki
    Nishijima, Kenichi
    Watanabe, Heiji
    Yasutake, Kiyoshi
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2006, 45 (10B): : 8488 - 8493
  • [10] Low-temperature crystallization of amorphous silicon by atmospheric-pressure plasma treatment in H2/He or H2/Ar mixture
    Ohmi, Hiromasa
    Kakiuchi, Hiroaki
    Nishijima, Kenichi
    Watanabe, Heiji
    Yasutake, Kiyoshi
    Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, 2006, 45 (10 B): : 8488 - 8493