Electrodeposition of n-type and p-type ZnSe thin films for applications in large area optoelectronic devices

ZnSe layers have been grown by a low temperature (∼65 °C) electrochemical deposition technique in an aqueous medium. The resulting thin films have been characterized using X-ray diffraction (XRD) and a photoelectrochemical (PEC) cell for determination of the bulk properties and electrical conductivity type. XRD patterns indicate the growth of ZnSe layers with (1 1 1) as the preferred orientation. PEC studies show p-type semiconducting properties for the as deposited layers and n-type ZnSe can be produced by appropriate doping. Annealing at 250 °C for 15 min improves the crystallinity of the layers and the photoresponse of the ZnSe/electrolyte junction. © 1998 Kluwer Academic Publishers