Crystal orientation-dependent fatigue characteristics in micrometer-sized single-crystal silicon

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作者
Tsuyoshi Ikehara
Toshiyuki Tsuchiya
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[1] National Institute of Advanced Industrial Science and Technology (AIST),Department of Micro Engineering
[2] Graduate School of Engineering,undefined
[3] Kyoto University,undefined
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Repetitive bending fatigue tests were performed using five types of single-crystal silicon specimens with different crystal orientations fabricated from {100} and {110} wafers. Fatigue lifetimes in a wide range between 100 and 1010 were obtained using fan-shaped resonator test devices. Fracture surface observation via scanning electron microscope (SEM) revealed that the {111} plane was the primary fracture plane. The crack propagation exponent n was estimated to be 27, which was independent of the crystal orientation and dopant concentration; however, it was dependent on the surface conditions of the etched sidewall. The fatigue strengths relative to the deflection angle were orientation dependent, and the ratios of the factors obtained ranged from 0.86 to 1.25. The strength factors were compared with those obtained from finite element method stress analyses. The calculated stress distributions showed strong orientation dependence, which was well-explained by the elastic anisotropy. The comparison of the strength factors suggested that the first principal stress was a good criterion for fatigue fracture. We include comparisons with specimens tested in our previous report and address the tensile strength, initial crack length, volume effect, and effects of surface roughness such as scallops.
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