Maskless nonlinear lithography with femtosecond laser pulses

被引：0
|
作者：
J. Koch
E. Fadeeva
M. Engelbrecht
C. Ruffert
H.H. Gatzen
A. Ostendorf
B.N. Chichkov
机构：
[1] Laser Zentrum Hannover e.V.,Institute for Microtechnology
[2] Hanover University,undefined
来源：
Applied Physics A | 2006年 / 82卷 / 1期
关键词：
Laser Pulse; Femtosecond Laser; Femtosecond Laser Pulse; Short Processing Time; Lithium Niobate Crystal;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
Development of maskless lithography techniques can provide a potential solution for the photomask cost issue. Furthermore, it could open a market for small-scale manufacturing applications. Since femtosecond lasers have been found suitable for processing of a wide range of materials with sub-micrometer resolution – whereas the limit of achievable structure sizes is predicted to be below 100 nm – it is attractive to use this technique for maskless lithography. In this paper, we present the first results on super-resolution femtosecond laser lithography, which show great potential for future applications.
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页码：23 / 26
页数：3
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