Double-exposure variable shear holographic interferometry with controlled sensitivity

被引：0
|
作者：
I. A. Lyavshuk
A. M. Lyalikov
机构：
[1] Kupala State University,
来源：
Optics and Spectroscopy | 2006年 / 101卷
关键词：
42.40.Kw;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
A method of simultaneous recording of double-exposure holograms with different lateral shears is proposed. This method makes it possible to reconstruct a series of interference patterns representing the phase shift caused by the object under study with different sensitivities. Aberration-free interference patterns in fringes of infinite and finite width with different visualization sensitivities for melting zones of a flat polyme-thylmethacrylate sample are presented.
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页码：962 / 966
页数：4
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