Emission of secondary ions from 3d, 4d, and 5d transition metals under chloro-trifluoro-methane CClF3 as reactant gas

被引：0
|
作者：
Björn Schlosser
W. Seidel
机构：
[1] Physikalisch-chemisches Institut,
[2] Justus-Liebig-Universität Giessen,undefined
[3] Heinrich-Buff-Ring 58,undefined
[4] D-35392 Giessen,undefined
[5] Germany,undefined
来源：
Fresenius' Journal of Analytical Chemistry | 1998年 / 361卷
关键词：
Halogen; Surface Interaction; Polycrystalline Sample; Small Signal; Strong Polarization;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
Surface interactions of CClF3 with polycrystalline samples of Ti, V, Cr, Mn, Fe, Co, Ni, Cu, Nb, Mo, Rh, Pd, Ag, Ta, W, Re, Ir, and Pt were investigated by means of moderate dynamic SIMS. As observed with other reactant gases these transition metals in most cases appear to be discernible into “dissociative” and (partial) “molecular” adsorbents. Small signals of oxidic secondary ions which are detectable for residual gas conditions vanished under the action of CClF3. However, due to strong polarization by either of the halogens, the emission of Me2+ ions is enhanced for Ti, V, and Nb.
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页码：433 / 436
页数：3
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