Atomic-layer deposition of thin titanium dioxide films from tetramethoxytitanium and water

被引：0
|
作者：
A. P. Alekhin
A. M. Markeev
D. V. Ovchinnikov
A. A. Solov’ev
V. F. Toknova
机构：
[1] Moscow Institute of Physics and Technology (State University),
来源：
Russian Journal of Applied Chemistry | 2013年 / 86卷
关键词：
Hydroxyapatite; Reaction Cycle; Constant Growth Rate; Thin Titanium Dioxide Film; Precursor System;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
Comparative analysis of atomic-layer deposition of titanium dioxide in precursor systems Ti(OCH3)4-H2O and Ti(OC2H5)4-H2O demonstrated that the growth rate of titanium dioxide produced by atomic-layer deposition in the Ti(OCH3)4-H2O system can be adequately estimated using a model taking into account the number and size of ligands in the metal-containing precursor. Studies in simulated body fluids demonstrated that polycrystalline anatase TiO2 coatings are capable of accelerated osteointegration, which makes this precursor promising for development of new biomedical articles.
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页码：817 / 823
页数：6
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