Surface scattering mechanisms of tantalum nitride thin film resistor

被引:0
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作者
Huey-Ru Chen
Ying-Chung Chen
Ting-Chang Chang
Kuan-Chang Chang
Tsung-Ming Tsai
Tian-Jian Chu
Chih-Cheng Shih
Nai-Chuan Chuang
Kao-Yuan Wang
机构
[1] National Sun Yat-Sen University,Department of Electrical Engineering
[2] National Sun Yat-Sen University,Department of Physics
[3] National Sun Yat-Sen University,Department of Materials and Optoelectronic Science
[4] Walsin Technology Co,R&D Department
来源
Nanoscale Research Letters | / 9卷
关键词
TaN; Thin film resistor; Temperature coefficient of resistance; Surface scattering;
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摘要
In this letter, we utilize an electrical analysis method to develop a TaN thin film resistor with a stricter spec and near-zero temperature coefficient of resistance (TCR) for car-used electronic applications. Simultaneously, we also propose a physical mechanism mode to explain the origin of near-zero TCR for the TaN thin film resistor (TFR). Through current fitting, the carrier conduction mechanism of the TaN TFR changes from hopping to surface scattering and finally to ohmic conduction for different TaN TFRs with different TaN microstructures. Experimental data of current–voltage measurement under successive increasing temperature confirm the conduction mechanism transition. A model of TaN grain boundary isolation ability is eventually proposed to influence the carrier transport in the TaN thin film resistor, which causes different current conduction mechanisms.
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