Low-temperature crystallization of thin silicate layer on crystalline Fe dust

被引：0
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作者：
Chihiro Kaito
Akihito Kumamoto
Yoshio Saito
Ryoichi Ono
机构：
[1] Ritsumeikan University,Laboratory for Nano
来源：
Earth, Planets and Space | 2010年 / 62卷
关键词：
Low-temperature crystallization; silicate layer; crystalline dust; crystobalite; oxidation energy;
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摘要：
The crystallization of an amorphous SiO layer covering Fe crystal grains has been clarified by high-resolution transmission electron microscopic (HRTEM) observation. Cristobalite crystals were produced preferentially on the (110) surface of Fe particles by the oxidation of silicon crystallites in the SiO layer, i.e. the oxidation energy of the silicon crystallites resulted in the epitaxial growth of the oxide layer on the Fe surface. The chemical reaction energy due to the oxidation of silicon crystallites in the SiO layer was concentrated at the interface of the crystal and the amorphous layer. Crystal growth took place from the Fe grain surface.
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页码：29 / 31
页数：2
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