Pulse electrodeposition of titanium on carbon steel in the LiF–NaF–KF eutectic melt

Electrodeposition of titanium was carried out in the K3TiF6–LiF–NaF–KF melt using both direct (DC) and unipolar pulse current (PC) techniques. Dense and smooth titanium coatings were obtained by PC plating at 750 °C whereas DC plating led to rough and dendritic deposits. The best results were obtained using a 100 μC cm−2 pulse charge and a cathodic current density of 50 and 75 mA cm−2. The cathodic current efficiency was in the range 60–65%. The titanium deposits obtained under such conditions behaved similarly to CP-titanium in NaCl and HNO3 solutions at room temperature.