Growth and characterizations of InP self-assembled quantum dots embedded in InAIP grown on GaAs substrates

被引:0
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作者
Jae-Hyun Ryou
Russell D. Dupuis
C. V. Reddy
Venkatesh Narayanamurti
David T. Mathes
Robert Hull
Alexander Mintairov
James L. Merz
机构
[1] The University of Texas at Austin,Microelectronics Research Center
[2] Harvard University,Gordon McKay Laboratory of Applied Sciences
[3] The University of Virginia,Department of Materials Science and Engineering
[4] University of Notre Dame,Department of Electrical Engineering
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关键词
InP; self-assembled quantum dots; islands; metalorganic chemical vapor deposition; atomic force microscopy; photoluminescence; transmission electron microscopy;
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摘要
We report the characteristics of InP self-assembled quantum dots embedded in In0.5Al0.5P on GaAs substrates grown by metalorganic chemical vapor deposition. The InP quantum dots show increased average dot sizes and decreased dot densities, as the growth temperature increases from 475°C to 600°C with constant growth time. Above the growth temperature of 600°C, however, dramatically smaller and densely distributed self-assembled InP quantum dots are formed. The small InP quantum dots grown at 650°C are dislocation-free “coherent” regions with an average size of ∼20 nm (height) and a density of ∼1.5 × 108 mm−2. These InP quantum dots have a broad range of luminescence corresponding to red or organge in the visible spectrum.
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页码:471 / 476
页数:5
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