Van der Waals epitaxy between the highly lattice mismatched Cu-doped FeSe and Bi2Te3

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作者
Arsham Ghasemi
Demie Kepaptsoglou
Pedro L Galindo
Quentin M Ramasse
Thorsten Hesjedal
Vlado K Lazarov
机构
[1] University of York,Department of Physics
[2] SuperSTEM Laboratory,Department of Computer Science and Engineering
[3] SciTech Daresbury Campus,Department of Physics
[4] Universidad de Cádiz,undefined
[5] Clarendon Laboratory,undefined
[6] University of Oxford,undefined
来源
NPG Asia Materials | 2017年 / 9卷
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摘要
We present a structural and density functional theory study of FexCu1−xSe within the three-dimensional topological insulator Bi2Te3. The FexCu1−xSe inclusions are single-crystalline and epitaxially oriented with respect to the Bi2Te3 thin film. Aberration-corrected scanning transmission electron microscopy and electron energy loss spectroscopy show an atomically sharp FeICu1−xSe/Bi2Te3 interface. The FexCu1−xSe/Bi2Te3 interface is determined by Se–Te bonds and no misfit dislocations are observed, despite the different lattice symmetries and large lattice mismatch of ∼19%. First-principle calculations show that the large strain at the FexCu1−xSe/Bi2Te3 interface can be accommodated by van der Waals-like bonding between Se and Te atoms.
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页码:e402 / e402
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