Catalytic Effects of Cr on Nitridation of Silicon and Formation of One-dimensional Silicon Nitride Nanostructure

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作者
Feng Liang
Lilin Lu
Liang Tian
Faliang Li
Haijun Zhang
Shaowei Zhang
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[1] The State Key Laboratory of Refractories and Metallurgy,
[2] Wuhan University of Science and Technology,undefined
[3] College of Engineering,undefined
[4] Mathematics and Physical Sciences,undefined
[5] University of Exeter,undefined
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The catalytic effects of chromium (Cr) on the direct nitridation of silicon (Si) and morphology of nitridation product were investigated. Cr dramatically improved the conversation of Si to silicon nitride (Si3N4). The complete conversion was achieved at 1350 °C upon addition of 1.25 wt% Cr. This temperature was much lower than that required in the case without using a catalyst. Meanwhile, Cr played an important role in the in-situ growth of one-dimensional (1-D) α-Si3N4 nanostructures. α-Si3N4 nanowires and nanobelts became the primary product phases when 5 wt% Cr was used as the catalyst. The growth processes of the 1-D α-Si3N4 nanostructures were governed by the vapor-solid mechanism. First-principle calculations suggest that electrons can be transferred from Cr atoms to N atoms, facilitating the Si nitridation.
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