A 64 × 64 CMOS Active Pixel Sensor Operative at a Very Low Illumination Level

被引:0
|
作者
Jae-Hyoun Park
Hoon Kim
Sang-Ho Seo
Jang-Kyoo Shin
机构
[1] Korea Electronics Technology Institute,NANO Scale Quantum Devices Research Center
[2] Kyungpook National University,Department of Electronics
来源
Optical Review | 2005年 / 12卷
关键词
CMOS image sensor; active pixel; PMOSFET photodetector; low illumination;
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中图分类号
学科分类号
摘要
A CMOS image sensor that focuses on very low illumination applications is described. The sensor uses a 0.35 μm 2-poly 4-metal standard CMOS process and is realized as a 64 × 64 array of 7.8 × 7.4 μm2 active pixels with a fill factor of 33%. The unit pixel contains 3 NMOSFETs and a gate-body tied PMOSFET photodetector. The image sensor features highly sensitive characteristics because of the photodetector which has a maximum photo-responsivity of 2.5 × 102 A/W, and a pixel configuration with a voltage gain of about 1.3 and a pixel sensitivity of 1.2 × 10 V/lx·s. Furthermore, this sensor has a well-defined output voltage at a very low illumination level of sub-10 lx, such as with a photo-sensitivity of 35mV/lx without adjusting gain and integration time.
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页码:196 / 201
页数:5
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