Characterization and control of microstructure in combinatorially prepared aluminum-silicon thin film nanocomposites

被引：0
|
作者：
Olk C.H. [1 ]
Haddad D.B. [1 ]
机构：
[1] Materials and Processes Laboratory, General Motors Research and Development Center, Warren
来源：
Journal of Materials Research | 2006年 / 21卷 / 5期
关键词：
D O I：
10.1557/jmr.2006.0164
中图分类号：
学科分类号：
摘要：
In this paper, we describe the application of thin film combinatorial deposition methods to systematically control the microstructure of AlxSi(1-x) alloys through variations in composition and growth temperature. Discrete libraries of compositionally graded films have been sputter deposited onto silicon substrates to produce two structural phase regions: amorphous a-(Al-Si) and amorphous a-Si plus crystalline c-Al. The microstructure was investigated using x-ray diffraction while atomic force microscopy techniques were used to obtain surface morphology and phase distribution. © 2006 Materials Research Society.
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页码：1221 / 1228
页数：7
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