Processing of vacuum microelectronic devices by focused ion and electron beams

被引：0
|
作者：
M. Takai
W. Jarupoonphol
C. Ochiai
O. Yavas
Y.K. Park
机构：
[1] Research Center for Materials Science at Extreme Conditions and Graduate School of Engineering Science,
[2] Osaka University,undefined
[3] Osaka,undefined
[4] Japan,undefined
来源：
Applied Physics A | 2003年 / 76卷
关键词：
PACS: 85.45.-w; 85.45.Bz; 85.45.Db; 85.40.Sz;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
Localized physical and chemical reactions induced by focused ion and electron beams, i.e. dual beams, have been used to fabricate field emitters (FEs) and their arrays, field-emitter arrays (FEAs), without masking and annealing processes. Issues arising from beam processing such as beam-induced damage and contamination were eliminated to provide FEAs with low leakage current. Quick prototyping and repairing processes of FEs and FEAs using dual-beam processing have been demonstrated.
引用
收藏
页码：1007 / 1012
页数：5
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