Relative stability of boiling of FC-72 and HFE-7100 with applications to electronic device cooling

被引:0
|
作者
Liu Z.W. [1 ]
Lin W.W. [1 ]
Lee D.J. [1 ]
Peng X.F. [2 ]
机构
[1] Department of Chemical Engineering, National Taiwan University
[2] Department of Thermal Engineering, Tsinghua University
关键词
Boiling; FC-72; HFE-7100; Relative stability; Subcooling;
D O I
10.1007/s11630-000-0076-0
中图分类号
学科分类号
摘要
This paper investigates the relative stability between nucleate and film boiling modes of FC-72 and HFE-7100, which have potential to electronic device cooling applications. Equilibrium heat flux, qc, which refers to as an index for measuring the relative stability of boiling, was obtained at a liquid subcooling of 0-20 K. Experimental results reveal that (1) qc increases with liquid subcooling; (2) although the FC-72 exhibits a higher critical heat flux (CHF) than does the HFE-7100, somewhat unexpectedly, the equilibrium heat flux for the latter is greater than the former. Restated, at a prescribed heat flux, the risk to burnout for boiling of FC-72 is higher than that of HFE-7100. The shift in boiling curves interprets the experimental findings.
引用
收藏
页码:352 / 355
页数:3
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