Optical spectroscopy of a-plane-oriented ZnO epilayers grown by plasma-assisted molecular beam epitaxy

被引:0
|
作者
B. Lo
M. B. Gaye
A. Dioum
C. M. Mohrain
M. S. Tall
J. M. Chauveau
M. Doninelli Tesseire
S. Ndiaye
A. C. Beye
机构
[1] Faculté des Sciences et Techniques,Groupe Physique des Solides et Sciences des Matériaux
[2] Université Cheikh Anta Diop de Dakar (UCAD),Centre de Recherche sur l’Hétéro
[3] Centre National de la Recherche Scientifique (CRHEA-CNRS),Epitaxie et ses Applications
[4] University of Nice Sophia Antipolis,undefined
来源
Applied Physics A | 2014年 / 115卷
关键词
Free Exciton; Reflection High Energy Electron Diffraction; Exciton Energy; Longitudinal Optical Phonon; Reflection High Energy Electron Diffraction Pattern;
D O I
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中图分类号
学科分类号
摘要
a-plane ZnO layers were successfully grown, by plasma-assisted molecular beam epitaxy, on r-plane (011–2) sapphire substrates. Several features attributed to the A, B and C free excitonic transitions are identified through temperature-dependent photoluminescence (PL) and reflectivity measurements. The temperature dependence of the peak energy positions of these transitions was studied from 8 K to 300 K. So, the PL peak energy of the A free exciton was plotted and fitted with a Varshni empirical equation. In the σ polarization (E⊥c), for which A and B are allowed, the reflectivity spectrum measured at 8 K was fitted by using a program based on the theory of the spatial resonance dispersion Hopfield model. Our results indicate that the A and B free excitonic features are at a higher energy than those in ZnO on c-oriented sapphire and show a good PL even at 250 K. These results also show that the new and intense emission peak observed in the region of the first phonon replica (3.33–3.28 eV) and identified as a stacking fault in the epilayer disappears at high temperature above 150 K.
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页码:257 / 261
页数:4
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