Enabling direct laser writing of cellulose-based submicron architectures

被引：0
|
作者：
Maximilian Rothammer
Marie-Christin Heep
Georg von Freymann
Cordt Zollfrank
机构：
[1] Technical University of Munich,Chair of Biogenic Polymers
[2] University of Kaiserslautern,Physics Department and Research Centre OPTIMAS
[3] Fraunhofer Institute for Industrial Mathematics ITWM,undefined
来源：
Cellulose | 2018年 / 25卷
关键词：
Cellulose methacrylate; Bio-based photoresist; Direct laser writing; Submicron patterning;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
页码：6031 / 6039
页数：8
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