Use of the ASPEN Plus Process Simulator in Modeling Systems Containing Hydrofluoric Acid

被引：0

作者：

R. S. Basu

R. R. Singh

R. A. Smith

机构：

[1] Honeywell International,

[2] Inc.,undefined

[3] Honeywell International,undefined

[4] Inc,undefined

来源：

International Journal of Thermophysics | 2001年 / 22卷

关键词：

ASPEN Plus process simulator; CFC-113a; dichlorodifluoromethane; equation of state; HCFC-22; HFC-134a; heat capacity; hydrofluoric acid; 1,1,1,2-tetrafluoroethane; 1,1,1-trichloro-2,2,2-trifluoroethane; vapor phase association; VLE;

D O I：

暂无

中图分类号：

学科分类号：

摘要：

Nonideal association in the vapor phase of HF poses a challenge in modeling. In this paper, a hybrid HF equation in the ASPEN Plus process simulation software and an equation of Anderko and co-workers are compared. Lencka and Anderko used a general framework to combine a simple association model with a cubic equation. This formulation helps to represent the phase behaviors of HF and halocarbon mixtures, especially for systems containing two liquid phases.

引用

页码：1487 / 1496

页数：9

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