Separation of SiO2 Films from the Surface of Silicon Nanofibers Using a High-Temperature Vacuum Installation

被引:0
|
作者
A. V. Isakov
M. V. Laptev
A. O. Khudorozhkova
A. S. Shmygalev
A. P. Apisarov
机构
[1] Institute of High-Temperature Electrochemistry,
[2] Ural Branch,undefined
[3] Russian Academy of Sciences,undefined
来源
Russian Metallurgy (Metally) | 2023年 / 2023卷
关键词
salt melts; potassium hexafluorosilicate; silicon nanofibers; electrolysis; high-temperature vacuum processing;
D O I
暂无
中图分类号
学科分类号
摘要
引用
收藏
页码:173 / 177
页数:4
相关论文
共 50 条
  • [1] Separation of SiO2 Films from the Surface of Silicon Nanofibers Using a High-Temperature Vacuum Installation
    Isakov, A. V.
    Laptev, M. V.
    Khudorozhkova, A. O.
    Shmygalev, A. S.
    Apisarov, A. P.
    RUSSIAN METALLURGY, 2023, 2023 (02): : 173 - 177
  • [2] Improving on surface and high-temperature strength of sapphire by SiO2 films
    Feng, LP
    Liu, ZT
    JOURNAL OF INORGANIC MATERIALS, 2006, 21 (01) : 217 - 222
  • [3] High-temperature zinc doping of silicon from zinc-containing SiO2 films
    Voronkova, GM
    Zuev, AV
    Zuev, VV
    Kiryukhin, AD
    Chepik, LF
    Troshina, EP
    INORGANIC MATERIALS, 2003, 39 (09) : 904 - 910
  • [4] High-Temperature Zinc Doping of Silicon from Zinc-Containing SiO2 Films
    G. M. Voronkova
    A. V. Zuev
    V. V. Zuev
    A. D. Kiryukhin
    L. F. Chepik
    E. P. Troshina
    Inorganic Materials, 2003, 39 : 904 - 910
  • [5] INTERNAL STRESSES IN SIO2 FILMS OBTAINED BY METHOD OF HIGH-TEMPERATURE SILICON OXIDATION
    VERKHOVS.EI
    AZHAZHA, EG
    EPIFANOV, GI
    SANZHARO.AT
    DOKLADY AKADEMII NAUK SSSR, 1973, 208 (02): : 329 - 330
  • [6] Centrifugally spun silica (SiO2) nanofibers for high-temperature air filtration
    Tepekiran, Beyza Nur
    Calisir, Mehmet D.
    Polat, Yusuf
    Akgul, Yasin
    Kilic, Ali
    AEROSOL SCIENCE AND TECHNOLOGY, 2019, 53 (08) : 921 - 932
  • [7] FORMATION AND HIGH-TEMPERATURE STABILITY OF COSIX FILMS ON AN SIO2 SUBSTRATE
    MORGAN, AE
    RITZ, KN
    BROADBENT, EK
    BHANSALI, AS
    JOURNAL OF APPLIED PHYSICS, 1990, 67 (10) : 6265 - 6268
  • [8] HIGH-TEMPERATURE DECOMPOSITION OF SIO2 AT THE SI/SIO2 INTERFACE
    RUBLOFF, GW
    TROMP, RM
    VANLOENEN, EJ
    BALK, P
    LEGOUES, FK
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1986, 4 (03): : 1024 - 1025
  • [9] HIGH-TEMPERATURE SIO2 DECOMPOSITION AT THE SIO2/SI INTERFACE
    TROMP, R
    RUBLOFF, GW
    BALK, P
    LEGOUES, FK
    VANLOENEN, EJ
    PHYSICAL REVIEW LETTERS, 1985, 55 (21) : 2332 - 2335
  • [10] High-temperature stability of SiO2 oxide film on surface of SiC
    Yamaguchi S.
    Yusufu A.
    Shirahama T.
    Murakami Y.
    Onitsuka T.
    Uno M.
    Transactions of the Atomic Energy Society of Japan, 2019, 18 (04) : 219 - 225