Improving the Electrical Properties of Zr-Doped Bi3.15Nd0.85Ti3O12 Thin Films by Engineering Polarization Rotation

被引:0
|
作者
Feng Yang
Yichen Guo
Zhihao Zong
Xuehong Hao
Yiwen Shi
Minghua Tang
机构
[1] University of Jinan,School of Materials Science and Engineering
[2] University of Jinan,Key Laboratory of Inorganic Functional Materials in Universities of Shandong
[3] Hunan Provincial National Defense Key Laboratory of Key Film Materials & Application for Equipments,undefined
来源
关键词
Ferroelectric; thin film; engineering polarization rotation; bismuth titanate; electrical properties;
D O I
暂无
中图分类号
学科分类号
摘要
Nd3+/Zr4+-cosubstituted bismuth titanate (BNTZx, x = 0, 0.05, 0.1, 0.3, and 0.5) thin films have been fabricated by chemical solution deposition and their polarization hysteresis loops, leakage current, and capacitance butterfly loops investigated. Results show that, at Zr content of x = 0.1, both capacitance and remanent polarization can be greatly improved. The BNTZ0.1 film also exhibits fatigue-free, excellent leakage current characteristics (I ≈ 9.44 × 10−9 A) at applied voltage of 3 V. High-quality c-axis-oriented BNTZx = 0.1 films with improved electrical properties were fabricated; this finding supports the feasibility of engineering polarization rotation in ferroelectric bismuth titanate (as suggested theoretically by Roy et al. in Appl. Phys. Lett. 102:182901, 2013).
引用
收藏
页码:3540 / 3545
页数:5
相关论文
共 50 条
  • [1] Improving the Electrical Properties of Zr-Doped Bi3.15Nd0.85Ti3O12 Thin Films by Engineering Polarization Rotation
    Yang, Feng
    Guo, Yichen
    Zong, Zhihao
    Hao, Xuehong
    Shi, Yiwen
    Tang, Minghua
    JOURNAL OF ELECTRONIC MATERIALS, 2016, 45 (07) : 3540 - 3545
  • [2] Structure and electrical properties of Bi3.15Nd0.85Ti3O12 ferroelectric thin films
    Wu, D
    Li, AD
    Ming, NB
    JOURNAL OF APPLIED PHYSICS, 2004, 95 (08) : 4275 - 4281
  • [3] Anisotropic polarization fatigue in Bi3.15Nd0.85Ti3O12 thin films
    Yang, Feng
    Guo, Yichen
    Li, Luyan
    Tang, Minghua
    JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2016, 49 (19)
  • [4] Electrical properties of V-doped Bi3.15Nd0.85Ti3O12 thin films with different contents
    Ye, Z.
    Tang, M. H.
    Zhou, Y. C.
    Zheng, X. J.
    Cheng, C. P.
    Hu, Z. S.
    Hu, H. P.
    APPLIED PHYSICS LETTERS, 2007, 90 (08)
  • [5] Effect of processing on the properties of Bi3.15Nd0.85Ti3O12 thin films
    Giridharan, N. V.
    Supriya, S.
    THIN SOLID FILMS, 2008, 516 (16) : 5244 - 5247
  • [6] Preparation and waveguide properties of Bi3.15Nd0.85Ti3O12 thin films
    Wang, Yuehua
    Gong, Sai
    Pan, Hongliang
    JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2008, 41 (10)
  • [7] Ferroelectric properties of Zr-doped Bi3.15Nd0.85Ti3O12 thin film deposited by a sol-gel method
    Yu, Jun
    Li, Jia
    Wang, Yunbo
    Peng, Gang
    Guo, Dongyun
    INTEGRATED FERROELECTRICS, 2006, 85 : 77 - 83
  • [8] Polarization offset of homogeneous Bi3.15Nd0.85Ti3O12 ferroelectric thin films
    Wu, Hao
    Wu, Di
    Li, Aidong
    JOURNAL OF APPLIED PHYSICS, 2008, 104 (07)
  • [9] Microstructure and electrical properties of ferroelectric Bi3.15Nd0.85Ti3O12/BiFeO3/Bi3.15Nd0.85Ti3O12 trilayered thin films on Pt/Ti/SiO2/Si
    Qi, Hongyan
    Wang, Huaixin
    Xu, Xiaojun
    Tang, Yu
    Xiao, Pengcheng
    Xiao, Ming
    JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS, 2017, 28 (18) : 13757 - 13762
  • [10] Microstructure and electrical properties of ferroelectric Bi3.15Nd0.85Ti3O12/BiFeO3/Bi3.15Nd0.85Ti3O12 trilayered thin films on Pt/Ti/SiO2/Si
    Hongyan Qi
    Huaixin Wang
    Xiaojun Xu
    Yu Tang
    Pengcheng Xiao
    Ming Xiao
    Journal of Materials Science: Materials in Electronics, 2017, 28 : 13757 - 13762