Determination of microamount of silicon in steel by inductively coupled plasma-atomic emission spectrometry

被引：0
|
作者：
Gong, J [1 ]
Zhang, WL
Qiu, DR
Yang, PY
Hu, K
Wang, H
You, JF
机构：
[1] Fudan Univ, Dept Chem, Shanghai 200433, Peoples R China
[2] Shanghai Inst Metrol Testing Tech, Shanghai 200233, Peoples R China
来源：
CHINESE JOURNAL OF ANALYTICAL CHEMISTRY | 2000年 / 28卷 / 08期
关键词：
silicon; steel; inductively coupled plasma-atomic emission; spectrometry; microanalysis;
D O I：
暂无
中图分类号：
O65 [分析化学];
学科分类号：
070302 ; 081704 ;
摘要：
Based on reviewing references and wavelength tables, experimental investigation of Si lines for the determination of Si in steel is reported. Calibration was made under conditions of matrix match and blank correction. Limit of detection is 6 x 10(-4) % for Si 212.412 nm and Si 251.612 nm and is two orders of magnitude better than the current national standard methods.
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页码：971 / 973
页数：3
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