Diffusion of Si and Ge dimers on Ge (001) surfaces

被引:9
|
作者
Afanasieva, TV
Bulavenko, SY
Koval, IF
Zandvliet, HJW
机构
[1] Kiev TG Shevchenko State Univ, Radiophys Dept, Natl Taras Shevchenko, UA-252033 Kiev 33, Ukraine
[2] Univ Twente, Fac Sci & Technol, NL-7500 AE Enschede, Netherlands
[3] Univ Twente, MESA & Res Inst, NL-7500 AE Enschede, Netherlands
关键词
D O I
10.1063/1.1533107
中图分类号
O59 [应用物理学];
学科分类号
摘要
We have studied the various diffusion pathways of Si and Ge dimers on the Ge (001) surface using scanning tunneling microscopy. The adsorbed dimers can be classified into two categories: Dimers adsorbed on top. of the substrate rows and dimers adsorbed in the troughs between the substrate rows. There are three different diffusion pathways for the dimers: Along the substrate rows, across the substrate rows, and in the troughs between the substrate rows. The activation barriers for diffusion of these three pathways have been determined for both Ge and Si dimers on Ge (001). The barriers for dimer diffusion of the system Ge/Ge (001) are slightly lower than for the Si/Ge (001) system. As compared to Si on Si (001) the activation barriers for dimer diffusion on Ge (001) are significantly lower. (C) 2003 American Institute of Physics.
引用
收藏
页码:1452 / 1456
页数:5
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