New deposition process for dense YSZ films onto porous electrodes

被引:0
|
作者
Choy, KL [1 ]
Bai, W [1 ]
Steele, BCH [1 ]
机构
[1] Univ London Imperial Coll Sci Technol & Med, Dept Mat, London SW7 2BP, England
关键词
D O I
暂无
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
Dense and crack-free yttria-stabilised zirconia(YSZ), (ZrO2)(0.92)(Y2O3)(0.08) films (5-50 mu m thick) with fully stabilised cubic phase structure have been successfully deposited onto porous electrode substrates at relatively low temperatures by a novel and cost-effective aerosol assisted chemical vapour deposition in an electric field method. The microstructure of the deposited films was investigated using X-ny diffraction and scanning electron microscopy. AC impedance spectroscopy was used to investigate the electrical property of the YSZ film. Experimental results have demonstrated for the first time the technical viability and the cost-effectiveness of this novel technique for the manufacture of dense, crack-free, YSZ layers onto porous substrates for solid oxide fuel cell applications.
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收藏
页码:1177 / 1182
页数:6
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