Hydrogen-free carbon thin films prepared by new type surface-wave-sustained plasma (SWP)

被引:6
|
作者
Xu, Junqi [1 ]
Fan, Huiqing
Kousaka, Hiroyuki
Umehara, Noritsugu
Liu, Weiguo
机构
[1] Xian Technol Univ, Sch Optoelect Engn, Xian 710032, Peoples R China
[2] Northwestern Polytech Univ, Sch Mat Sci & Engn, Xian 710072, Peoples R China
[3] Nagoya Univ, Dept Mech Sci & Engn, Nagoya, Aichi 4640814, Japan
来源
SURFACE & COATINGS TECHNOLOGY | 2007年 / 201卷 / 15期
关键词
surface-wave-sustained plasma (SWP); plasma density; Raman spectroscopy; amorphous carbon films; DLC;
D O I
10.1016/j.surfcoat.2006.09.016
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
In this paper is described the simple structure of a new type surface-wave-sustained plasma (SWP) source without a magnetic field surrounding the chamber wall. In the source, the plasma is excited and sustained by 2.45 GHz microwaves, and the plasma density is measured by a single Langmuir probe in the target direction. The results indicate that the electron density obtained in this system is as high as 9 x 10(11) cm(-3) even at a low pressure of 2.8 Pa. A graphite target (99.998%) and argon (99.999%) are used for depositing hydrogen-free amorphous carbon films by the new SWP source. The Raman spectra of the carbon films were obtained, and the results denote that the structure of the carbon films prepared by SWP is typical of diamond-like carbon; the Raman intensity ratio I-D/I-G is 2.97. The surface morphology was investigated by using an atomic force microscope (AFM). The images demonstrate that the hydrogen-free carbon films deposited by SWP have a very smooth surface, with a grain size of about 20 nm and surface roughness R-a of about 0.778 nm. (c) 2006 Elsevier B.V. All rights reserved.
引用
收藏
页码:6631 / 6634
页数:4
相关论文
共 50 条
  • [1] Growth and properties of hydrogen-free DLC films deposited by surface-wave-sustained plasma
    Xu, Junqi
    Fan, Huiqing
    Kousaka, Hiroyuki
    Umehara, Noritsugu
    Diao, Dongfeng
    Liu, Weiguo
    DIAMOND AND RELATED MATERIALS, 2007, 16 (01) : 161 - 166
  • [2] Hydrogen-free carbon thin films prepared by unbalanced magnetron sputtering
    Xu, JQ
    Hang, LX
    Liu, WG
    Fan, HQ
    Xi, YX
    2ND INTERNATIONAL CONFERENCE ON ADVANCED OPTICAL MANUFACTURING AND TESTING TECHNOLOGIES: ADVANCED OPTICAL MANUFACTURING TECHNOLOGIES, 2006, 6149
  • [3] Effect of technique parameters on characteristics of hydrogen-free DLC films deposited by surface wave-sustained plasma
    Xu, JQ
    Kousaka, H
    Uniehara, N
    Diao, DF
    ICO20: MATERIALS AND NANOSTRUCTURES, 2006, 6029
  • [4] Plasma properties of a new surface-wave-sustained plasma source under the conditions of depositing DLC films
    Xu, Junqi
    Kousaka, Hiroyuki
    Umehara, Noritsugu
    Diao, Dongfeng
    SURFACE & COATINGS TECHNOLOGY, 2006, 201 (1-2): : 408 - 412
  • [5] New forms of hydrogen-free amorphous carbon films
    Logothetidis, S
    Gioti, M
    Lioutas, C
    FULLERENES AND CARBON BASED MATERIALS, 1998, 68 : 539 - 543
  • [6] New forms of hydrogen-free amorphous carbon films
    Logothetidis, S
    Gioti, M
    Lioutas, C
    CARBON, 1998, 36 (5-6) : 539 - 543
  • [7] Hydrogen-free amorphous carbon films approaching diamond prepared by magnetron sputtering
    Logothetidis, S
    APPLIED PHYSICS LETTERS, 1996, 69 (02) : 158 - 160
  • [8] Elastic properties of hydrogen-free amorphous carbon thin films and their relation with carbon-carbon bonding
    Logothetidis, S
    Charitidis, C
    THIN SOLID FILMS, 1999, 353 (1-2) : 208 - 213
  • [9] Characterization of diamond films deposited with a 915-MHz scaled-up surface-wave-sustained plasma
    Schelz, S
    Campillo, C
    Moisan, M
    DIAMOND AND RELATED MATERIALS, 1998, 7 (11-12) : 1675 - 1683
  • [10] Fluorine incorporated amorphous carbon thin films prepared by Surface Wave Microwave Plasma CVD
    Kalita, Golap
    Aryal, Hare Ram
    Adhikar, Sudip
    Ghimire, Dilip C.
    Afre, Rakesh A.
    Soga, Tetsuo
    Sharon, Maheshwar
    Umeno, Masayoshi
    DIAMOND AND RELATED MATERIALS, 2008, 17 (7-10) : 1697 - 1701