Natural gas density under extremely high pressure and high temperature: Comparison of molecular dynamics simulation with corresponding state model

被引:1
|
作者
Jin, Luchao [1 ]
He, Yongming [2 ]
Zhou, Guobing [3 ]
Chang, Qiuhao [3 ]
Huang, Liangliang [3 ]
Wu, Xingru [3 ]
机构
[1] Alchemy Sci Inc, 6002 Rogerdale Rd,Ste 125, Houston, TX 77072 USA
[2] Chengdu Sci & Technol Univ, Coll Energy, Chengdu 610059, Peoples R China
[3] Univ Oklahoma, 100 East Boyd St,Sarkeys Energy Ctr 1210, Norman, OK 73019 USA
关键词
High-pressure high temperature; Z-factor; Molecular dynamics simulation; Natural gas density; Correlations; PHASE-EQUILIBRIA; MIXTURES; EQUATION; RANGE;
D O I
10.1016/j.cjche.2020.07.043
中图分类号
TQ [化学工业];
学科分类号
0817 ;
摘要
This work applied molecular dynamics (MD) simulation to calculate densities of natural gas mixtures at extremely high pressure (> 138 MPa) and high temperature (> 200 degrees C) conditions (xHPHT) to bridge the knowledge and technical gaps between experiments and classical theories. The experimental data are scarce at these conditions which are also out of assumptions for classical predictive correlations, such as the Dranchuk & Abou-Kassem (DAK) equation of state (EOS). Force fields of natural gas components were carefully chosen from literatures and the simulation results are validated with experimental data. The largest relative error is 2.67% for pure hydrocarbons, 2.99% for C1/C3 mixture, 7.85% for C1/C4 mixture, and 8.47% for pure H2S. These satisfactory predictions demonstrate that the MD simulation approach is reliable to predict natural- and acid-gases thermodynamic properties. The validated model is further used to generate data for the study of the EOS with pressure up to 276 MPa and temperature up to 573 K. Our results also reveal that the Dranchuk & Abou-Kassem (DAK) EOS is capable of predicting natural gas compressibility to a satisfactory accuracy at xHPHT conditions, which extends the confidence range of the DAK EOS. (C) 2020 The Chemical Industry and Engineering Society of China, and Chemical Industry Press Co., Ltd. All rights reserved.
引用
收藏
页码:2 / 9
页数:8
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