Absorption and light scattering in InGaN-on-sapphire- and AlGaInP-based light-emitting diodes

被引:15
|
作者
Schad, SS [1 ]
Neubert, B
Eichler, C
Scherer, M
Habel, F
Seyboth, M
Scholz, F
Hofstetter, D
Unger, P
Schmid, W
Karnutsch, C
Streubel, K
机构
[1] Univ Ulm, Dept Optoelect, D-89069 Ulm, Germany
[2] Univ Neuchatel, CH-2000 Neuchatel, Switzerland
[3] OSRAM Opto Semicond, D-93049 Regensburg, Germany
关键词
absorption; AlGaInP; buffer absorption; buffer scattering; InGaN; light-emitting diodes (LEDs); nucleation;
D O I
10.1109/JLT.2004.832437
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Different experimental and simulation techniques aiming at a better understanding of lateral mode absorption in light-emitting diodes (LEDs) are presented in this paper. A measurement of transmitted power versus propagation distance allows us to derive the absorption losses of LED layer structures at their emission wavelength. Two models for the observed intensity distribution are presented: one is based on scattering, whereas the other relies on selective absorption. Both models were applied to InGaN-on-sapphire-based LED structures. Material absorption losses of 7 cm(-1) for the scattering model and 4 cm(-1) for the absorbing-layer model were obtained. Furthermore, these values are independent of the emission wavelength of the layer structure in the 403-433-nm range. The losses are most likely caused by a thin highly absorbing layer at the interface to the substrate. In a second step, interference of the modal field profile with the absorbing layer can be used to determine its thickness (d = 75 nm) and its absorption coefficient (alpha approximate to 3900 cm(-1)). This method has also been tested and applied on AlGaInP-based layer structures emitting at 650 nm. In this case, the intensity decay of alpha = 30 cm(-1) includes a contribution from the absorbing substrate.
引用
收藏
页码:2323 / 2332
页数:10
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