Micro-switches with sputtered Au, AuPd, Au-on-AuPt, and AuPtCu alloy electric contacts

被引:12
|
作者
Coutu, RA [1 ]
Kladitis, PE [1 ]
Cortez, R [1 ]
Strawser, RE [1 ]
Crane, RL [1 ]
机构
[1] USAF, Inst Technol, Dept Elect & Comp Engn, Wright Patterson AFB, OH 45433 USA
关键词
D O I
10.1109/HOLM.2004.1353120
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
This paper is the first to report on a new analytic model for predicting micro-contact resistance and the design, fabrication, and testing of microelectromechanical systems (MEMS) metal contact switches with sputtered bi-metallic (i.e. gold (Au)-on-Au-platinum (Pt), (Au-on-Au-(6%)Pt)), binary alloy (i.e. Au-palladium (Pd), (Au-(2%)Pd)), and tertiary alloy (i.e. Au-Pt-copper (Cu), (Au-(5%)Pt-(0.5%)Cu)) electric contacts. The micro-switches with bi-metallic and binary alloy contacts resulted in contact resistance between 1 - 2 Omega and, when compared to micro-switches with sputtered An electric contacts, exhibited a 3.3 and 2.6 times increase in switching lifetime, respectively. The tertiary alloy exhibited a 6.5 times increase in switch lifetime with contact resistance ranging from 0.2-1.8 Omega.
引用
收藏
页码:214 / 221
页数:8
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