Epitaxial growth of non-c-oriented ferroelectric SrBi2Ta2O9 thin films on Si(100) substrates

被引:0
|
作者
Lee, HN [1 ]
Senz, S [1 ]
Visinoiu, A [1 ]
Pignolet, A [1 ]
Hesse, D [1 ]
Gösele, U [1 ]
机构
[1] Max Planck Inst Mikrostrukturphys, D-06120 Halle, Germany
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T [工业技术];
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08 ;
摘要
Epitaxial SrBi2Ta2O9 (SBT) thin films with well-defined (116) orientation have been grown by pulsed laser deposition on Si(100) substrates covered with an yttria-stabilized ZrO2 (YSZ) buffer layer and an epitaxial layer of electrically conductive SrRuO3. Studies on the in-plane crystallographic relations between SrRuO3 and YSZ revealed a rectangle-on-cube epitaxy with respect to the substrate. X-ray diffraction pole figure measurements revealed well defined orientation relations, viz. SBT(116)\\ SrRuO3(110)\\ YSZ(100)\\ Si(100), SBT[110]\\ SrRuO3[001], and SrRuO3[111]\\ YSZ[110]\\ Si[110]. PACS: 77.84.-s; 68.55.-a; 81.15.Fg.
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页码:101 / 104
页数:4
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