Electrodeposition of bismuth telluride films from a nonaqueous solvent

被引:15
|
作者
Li, Wen-Jin [1 ]
机构
[1] Ind Technol Res Inst, Mat & Chem Res Labs, Hsinchu 310, Taiwan
关键词
Bi(2)Te(3) film; EQCM; DMSO; Electrodeposition; Cyclic voltammetry; QUARTZ-CRYSTAL MICROBALANCE; BI2TE3; FILMS; DEPOSITION; ARRAYS;
D O I
10.1016/j.electacta.2009.07.008
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
The author examines Bi(2)Te(3) deposition from a DMSO solution containing TeCl(4) and Bi(NO(3))(3) x 5H(2)O by means of cyclic voltammetry and electrochemical quartz crystal microbalance (EQCM). Accumulated charges and related mass changes for Bi(2)Te(3) deposition on working electrodes are measured in situ. The deposit composition is more dependent on Te(4+) concentrations in DMSO solution than on the potential. In a DMSO solution containing 0.01 M Te(4+) and 0.0075 M Bi(3+), Bi(2)Te(3) depositswere obtained in the potential range between -0.2 and -0.8V vs. Ag/AgCl. In a DMSO solution containing 0.05 M Te(4+) and 0.0375 M Bi(3+), Te-rich deposits were formed from -0.2 to -0.8V vs. Ag/AgCl. (C) 2009 Elsevier Ltd. All rights reserved.
引用
收藏
页码:7167 / 7172
页数:6
相关论文
共 50 条
  • [1] Electrodeposition of bismuth telluride thermoelectric films from a nonaqueous electrolyte using ethylene glycol
    Nguyen, Hai P.
    Wu, Minxian
    Su, Jiale
    Vullers, Ruud J. M.
    Vereecken, Philippe M.
    Fransaer, Jan
    ELECTROCHIMICA ACTA, 2012, 68 : 9 - 17
  • [2] Electrodeposition characteristics of Bismuth-Telluride films
    Prabhakar, A
    Podlaha-Murphy, EJ
    Murphy, MC
    Devireddy, R
    NANOSCALE MATERIALS SCIENCE IN BIOLOGY AND MEDICINE, 2005, 845 : 297 - 302
  • [3] Thermoelectric Properties of Bismuth Telluride Thin Films Electrodeposited from a Nonaqueous Solution
    Cicvaric, Katarina
    Meng, Lingcong
    Newbrook, Daniel W.
    Huang, Ruomeng
    Ye, Sheng
    Zhang, Wenjian
    Hector, Andrew L.
    Reid, Gillian
    Bartlett, Philip N.
    de Groot, C. H. Kees
    ACS OMEGA, 2020, 5 (24): : 14679 - 14688
  • [4] A novel route to nanostructured bismuth telluride films by electrodeposition
    Burton, M. R.
    Richardson, S. J.
    Staniec, P. A.
    Terrill, N. J.
    Elliott, J. M.
    Squires, A. M.
    White, N. M.
    Nandhakumar, Iris S.
    ELECTROCHEMISTRY COMMUNICATIONS, 2017, 76 : 71 - 74
  • [5] Phosphorus-doped bismuth telluride films by electrodeposition
    Zhou, Jian
    Lin, Qinghan
    Li, Hengyi
    Cheng, Xuan
    MATERIALS CHEMISTRY AND PHYSICS, 2013, 141 (01) : 401 - 405
  • [6] ELECTRODEPOSITION OF SILICON FROM A NONAQUEOUS SOLVENT
    GOBET, J
    TANNENBERGER, H
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1986, 133 (08) : C322 - C322
  • [7] ELECTRODEPOSITION OF SILICON FROM A NONAQUEOUS SOLVENT
    GOBET, J
    TANNENBERGER, H
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1988, 135 (01) : 109 - 112
  • [8] Electrodeposition of bismuth telluride on gold from acidic solutions
    Jia, FL
    Wang, W
    Huang, QH
    BULLETIN OF ELECTROCHEMISTRY, 2005, 21 (10): : 471 - 479
  • [9] Electrodeposition of bismuth, tellurium, and bismuth telluride thin films from choline chloride–oxalic acid ionic liquid
    Camelia Agapescu
    Anca Cojocaru
    Adina Cotarta
    Teodor Visan
    Journal of Applied Electrochemistry, 2013, 43 : 309 - 321
  • [10] Growth Mechanism during the Early Stages of electrodeposition of Bismuth telluride films
    Zimmer, Alexandre
    Broch, Laurent
    Boulanger, Clotilde
    Stein, Nicolas
    ELECTROCHIMICA ACTA, 2015, 174 : 376 - 383