The effect of substrate positions in chemical vapor deposition reactor on the growth of carbon nanotube arrays

被引：27

作者：

Li, Ge ^{[1
]}

Chakrabarti, Supriya ^{[1
]}

Schulz, Mark ^{[2
]}

Shanov, Vesselin ^{[1
]}

机构：

[1] Univ Cincinnati, Dept Chem & Mat Engn, Cincinnati, OH 45221 USA

[2] Univ Cincinnati, Dept Mech Engn, Cincinnati, OH 45221 USA

来源：

CARBON | 2010年 / 48卷 / 07期

基金：

美国国家科学基金会;

关键词：

D O I：

10.1016/j.carbon.2010.01.054

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

The effect of substrate positions inside the chemical vapor deposition reactor on the length and quality of the grown carbon nanotube (CNT) arrays is reported. It was found that longer CNT arrays are grown when located downstream on the platform in the reactor. This effect becomes more pronounced for increased growth time. Related factors such as temperature of the gas mixture and its flow velocity seem to be responsible for the behavior. The quality of the CNTs is not affected by the position of the substrates inside the reactor. Published by Elsevier Ltd.

引用

页码：2111 / 2115

页数：5

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