Hydrogen density-of-states in polycrystalline silicon

被引:16
|
作者
Nickel, NH [1 ]
Brendel, K [1 ]
机构
[1] Hahn Meitner Inst Berlin GmbH, D-12489 Berlin, Germany
关键词
D O I
10.1063/1.1570924
中图分类号
O59 [应用物理学];
学科分类号
摘要
The influence of laser crystallization on hydrogen bonding in polycrystalline silicon is investigated employing hydrogen effusion measurements. Fully crystallized poly-Si samples contain a residual H concentration of up to 1.5x10(22) cm(-3). From the effusion spectra, the H density-of-states distribution is derived. Interestingly, hydrogen bonding is affected by the deposition temperature of the amorphous starting material. Below the H transport states, four peaks are observed in the H density of states at approximate to-2.15, -2.4, -2.7, and -3.25 eV. (C) 2003 American Institute of Physics.
引用
收藏
页码:3029 / 3031
页数:3
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