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Hydrogen density-of-states in polycrystalline silicon
被引:16
|作者:
Nickel, NH
[1
]
Brendel, K
[1
]
机构:
[1] Hahn Meitner Inst Berlin GmbH, D-12489 Berlin, Germany
关键词:
D O I:
10.1063/1.1570924
中图分类号:
O59 [应用物理学];
学科分类号:
摘要:
The influence of laser crystallization on hydrogen bonding in polycrystalline silicon is investigated employing hydrogen effusion measurements. Fully crystallized poly-Si samples contain a residual H concentration of up to 1.5x10(22) cm(-3). From the effusion spectra, the H density-of-states distribution is derived. Interestingly, hydrogen bonding is affected by the deposition temperature of the amorphous starting material. Below the H transport states, four peaks are observed in the H density of states at approximate to-2.15, -2.4, -2.7, and -3.25 eV. (C) 2003 American Institute of Physics.
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页码:3029 / 3031
页数:3
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