Fabrication and evaluation of tunable submicron-thick monocrystalline silicon grating for integration on LSI circuit

被引：0
|
作者：
Sasaki, T. [1 ]
Chernroj, S. [1 ]
Matsuura, H. [2 ]
Hane, K. [1 ]
机构：
[1] Tohoku Univ, Dept Nanomech, Sendai, Miyagi, Japan
[2] Tohoku Gakuin Univ, Dept Mech Engn, Sendai, Miyagi, Japan
来源：
2015 INTERNATIONAL CONFERENCE ON OPTICAL MEMS AND NANOPHOTONICS (OMN) | 2015年
关键词：
tunable grating; large scale integration circuit; monocrystaline silicon; submicron menbrane transfer process; MODULATOR;
D O I：
暂无
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
We present a fabrication process and characteristics of tunable submicron-thick monocrystalline silicon grating for integration of LSI wafer. The grating structure was successfully fabricated. The ribbon of the grating was successfully actuated. The rise time of step response was about 20 mu s.
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页数：2
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