Lattice-matched Al0.95Ga0.05AsSb oxide for current confinement in InP-based long wavelength VCSELs

被引:2
|
作者
Reddy, MHM [1 ]
Buell, DA
Asano, T
Koda, R
Feezell, D
Huntington, AS
Coldren, LA
机构
[1] Univ Calif Santa Barbara, Dept Elect & Comp Engn, Santa Barbara, CA 93106 USA
[2] Univ Calif Santa Barbara, Dept Mat Engn, Santa Barbara, CA 93106 USA
关键词
molecular beam epitaxy; antimonides; oxide aperture; InP-based devices; semiconductor lasers;
D O I
10.1016/S0022-0248(02)02389-8
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
We examine, for the first time, Al0.95Ga0.05AsSb-oxide as the lateral current confining layer for InP-based optoelectronic devices including vertical cavity surface emitting lasers. In this paper, Al0.95Ga0.05AsSb-oxide confined broad area edge emitting lasers were used to study current confinement and optical loss. Results show that the threshold current density scales effectively down to a confining layer width of 6.5 mum and the differential efficiency remains unchanged down to 4 gm, indicating no aperture induced excess loss. This suggests that thin AlGaAsSb layers, at low oxidation temperatures, may get oxidized homogeneously without leaving metallic-Sb behind. (C) 2003 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:766 / 770
页数:5
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