WAFER SCALE COATING OF POLYMER CANTILEVER FABRICATED BY NANOIMPRINT LITHOGRAPHY

被引：2

作者：

Greve, Anders ^{[1
]}

Dohn, Soren ^{[1
]}

Keller, Stephan ^{[1
]}

Vig, Asger L. ^{[1
]}

Kristensen, Anders ^{[1
]}

Nielsen, Claus H. ^{[1
]}

Larsen, Niels B. ^{[1
]}

Boisen, Anja ^{[1
]}

机构：

[1] Tech Univ Denmark, Lyngby, Denmark

来源：

MEMS 2010: 23RD IEEE INTERNATIONAL CONFERENCE ON MICRO ELECTRO MECHANICAL SYSTEMS, TECHNICAL DIGEST | 2010年

关键词：

D O I：

10.1109/MEMSYS.2010.5442334

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Microcantilevers can be fabricated in TOPAS by nanoimprint lithography, with the dimensions of 500 mu m length 4.5 mu m thickness and 100 mu m width. By using a plasma polymerization technique it is possible to selectively functionalize individually cantilevers with a polymer coating, on wafer scale by using a shadow masking technique.

引用

页码：612 / 614

页数：3

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