Plasma immersion ion implantation.: New technology for homogeneous modification of the surface of medical implants of complex shapes

Plasma immersion ion implantation (PIII) is a new method for the inexpensive rapid modification of the near-surface region of medical implants of complex shapes. PIII combines the advantages of conventional plasma and ion beam technologies. This article describes the physical basis of the procedure and the construction of a PIII system, and presents typical PIII parameters. In a number of examples, the use of the PIII to modify the surface of biacompatible materials (chrome-nickel stainless steel, titanium, titanium-aluminium-vanadium alloy) with the aim of reducing wear, increasing biocompatibility or improving adhesion, is described. Finally, the possibilities of combining PIII with other technologies are considered.