Cubic boron nitride as a material for future electron device applications: A comparative analysis

被引:11
|
作者
Chilleri, John [1 ]
Siddiqua, Poppy [2 ]
Shur, Michael S. [3 ]
O'Leary, Stephen K. [2 ]
机构
[1] New Mexico Inst Min & Technol, Dept Math, Socorro, NM 87801 USA
[2] Univ British Columbia, Sch Engn, 3333 Univ Way, Kelowna, BC V1V 1V7, Canada
[3] Rensselaer Polytech Inst, Dept Elect Comp & Syst Engn, Troy, NY 12180 USA
基金
加拿大自然科学与工程研究理事会;
关键词
STEADY-STATE; GALLIUM NITRIDE; ZINC-OXIDE; TRANSPORT; SEMICONDUCTORS; ULTRAVIOLET; FREQUENCY; MOBILITY; FIGURE; MERIT;
D O I
10.1063/5.0084360
中图分类号
O59 [应用物理学];
学科分类号
摘要
Drawing upon a collection of electron transport results, coupled with a variety of other material parameters, we set expectations on the upper limits to device performance of zinc blende boron-nitride-based electron devices. We examine how the device performance varies with the device length-scale, noting that a diversity of physical regimes are experienced as the device length-scale reduces from that corresponding to a long electron device, i.e., 100 mu m, to the sub-micron level. Results corresponding to zinc blende boron nitride are contrasted with those associated with germanium, silicon, gallium arsenide, the 4H-phase of silicon carbide, wurtzite gallium nitride, and diamond. The electron device performance metrics that we focus upon for the purposes of this analysis include the effective mobility, accounting for the transition between the ballistic and the collision-dominated electron transport regimes, and the cutoff frequency. Published under an exclusive license by AIP Publishing.
引用
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页数:5
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