AES depth profiles of nitrogen ion implanted austenitic stainless steel

被引：1
|
作者：
Aggarwal, S
Mohindra, RK
Ghosh, PK
Bhatnagar, MC
机构：
[1] UNIV ROORKEE, WELDING RES LAB, DEPT MECH & IND ENGN, ROORKEE 247667, UTTAR PRADESH, INDIA
[2] INDIAN INST TECHNOL, DEPT PHYS, NEW DELHI 110016, INDIA
来源：
DISORDERED MATERIALS - CURRENT DEVELOPMENTS - | 1996年 / 223卷
关键词：
depth profile; austenitic stainless steel; Auger Electron Spectroscopy;
D O I：
10.4028/www.scientific.net/MSF.223-224.441
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
The depth profile of nitrogen, implanted in AISI 302, 310 and 321 stainless steels has been studied using Auger Electron Spectroscopy (AES) on two different surfaces as mechanically polished and chemically etched. Ion implantation was carried out at 130 keV with 2.5 x 10(21)N(2)m(-2) at similar to 300 degrees C. Nitrogen is observed to have diffused more than 350 nm in all these materials. Thickness of implantation modified regions is greater in polished specimens than in the etched ones. Diffusion of implanted nitrogen is also enhanced due to greater chromium contents of AISI 310 stainless steel then others.
引用
收藏
页码：441 / 444
页数：4
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