Electronic structures and bonding properties of Ti2AlC and Ti3AlC2

被引:14
|
作者
Min Xinmin [1 ]
Yi, Ren
机构
[1] Wuhan Univ Technol, Sch Sci, Dept Appl Chem, Wuhan 430070, Peoples R China
[2] Wuhan Univ Technol, State Key Lab Adv Technol Mat Synth & Proc, Wuhan 430070, Peoples R China
基金
中国国家自然科学基金;
关键词
Ti2AlC; Ti3SiC2; doping; electronic structure; chemical bond;
D O I
10.1007/s11595-005-1027-0
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The relation among electronic structure, chemical bond and property of Ti2AlC, Ti3AlC2 and doping Si into Ti2AlC was studied by density function and the discrete variation (DFT-DVM) method. After adding Si into Ti2AlC, the interaction between Si and Ti is weaker than that between Al and Ti, and the strengths of ionic and covalent bonds decrease both. The ionic and covalent bonds in Ti3AlC2, especially in Ti-Al, are stronger than those in Ti2AlC. Therefore, in synthesis of Ti2AlC, the addition of Si enhances the Ti3AlC2 content instead of Ti2AlC. The density of state (DOS) shows that there is mixed conductor characteristic in Ti2AlC and Ti3AlC2. The DOS of Ti3AlC2 is much like that of Ti2AlC. Ti(2)SixAl(1-x)C has more obvious tendency to form a semiconductor than Ti2AlC, which is seen from the obvious difference of partial DOS between Si and Al 3p.
引用
收藏
页码:27 / 30
页数:4
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