Silicon wire grid polarizer for ultraviolet applications

被引:22
|
作者
Weber, Thomas [1 ]
Kroker, Stefanie [1 ]
Kaesebier, Thomas [1 ]
Kley, Ernst-Bernhard [1 ]
Tuennermann, Andreas [1 ,2 ]
机构
[1] Univ Jena, Abbe Ctr Photon, Inst Appl Phys, D-07745 Jena, Germany
[2] Fraunhofer Inst Appl Opt & Precis Engn, D-07745 Jena, Germany
关键词
TRANSMISSION GRATINGS; VISIBLE-LIGHT; LITHOGRAPHY; FABRICATION;
D O I
10.1364/AO.53.008140
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
We present a silicon wire grid polarizer operating down to a wavelength of 300 nm. Besides metallic grating materials, semiconductors also offer appropriate material properties to realize wire grid polarizers in the ultraviolet (UV) spectral range. The presented polarizer with a period of 140 nm was realized by means of electron beam lithography and dry etching using amorphous silicon as the grating material. At a wavelength of 365 nm, a transmission of 42% and an extinction ratio of 90 (19.5 dB) are measured. The spectral bandwidth of these polarizers in the UV-spectral range is about 100 nm. (C) 2014 Optical Society of America.
引用
收藏
页码:8140 / 8144
页数:5
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