Stacking and interlayer electron transport in MoS2

被引:10
|
作者
Cusati, Teresa [1 ]
Fortunelli, Alessandro [2 ]
Fiori, Gianluca [1 ]
Iannaccone, Giuseppe [1 ]
机构
[1] Univ Pisa, Dipartimento Ingn Informaz, Via G Caruso 16, I-56122 Pisa, Italy
[2] CNR, ICCOM, Via Moruzzi 1, I-56124 Pisa, Italy
基金
欧盟地平线“2020”;
关键词
BILAYER MOS2; INTEGRATED-CIRCUITS; HETEROSTRUCTURES; MONOLAYER;
D O I
10.1103/PhysRevB.98.115403
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
In this paper, we investigate the effect of the stacking sequence in MoS2 multilayer systems on their electron transport properties, through first-principles simulations of structural and electron transport properties. We show that interlayer electron transport is highly sensitive to the stacking sequence of the multilayers, with specific sequences producing a much higher electron transmission due to larger orbital interactions and band-structure effects. These results explain contrasting experimental evidence on interlayer transport measurements as due to imperfect structural control, provide insight on modeling, and suggest ways to improve the performance of electron devices based on MoS2 multilayer systems via multilayer structure engineering.
引用
收藏
页数:7
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