The Role of Oxygen Vacancies on Switching Characteristics of TiOx Resistive Memories

被引：5
|
作者：
Zheng, Z. W. [1 ]
Hsu, H. H. [2 ]
Chen, P. C. [2 ]
Cheng, C. H. [3 ]
机构：
[1] Chinese Acad Sci, Inst Microelect, Beijing 100029, Peoples R China
[2] Natl Chiao Tung Univ, Dept Elect Engn, Hsinchu 300, Taiwan
[3] Natl Taiwan Normal Univ, Dept Mechatron Technol, Taipei 106, Taiwan
来源：
JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY | 2015年 / 15卷 / 06期
关键词：
Resistive Random Access Memory (RRAM); Filament; TiOx; Work Function; FILMS; IMPROVEMENT; RRAM;
D O I：
10.1166/jnn.2015.9763
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
Using oxygen vacancy rich (VO-rich) TiOx dielectric with high work function Ni electrode, large resistance window of > 10x and narrow current distribution were realized in the NiNO-rich TiOx/TaN resistive random access memory (RRAM) device. It can be ascribed to the formation and rupture of conducting filaments by the percolation of VOs and Ti interstitials. Moreover, the effects of annealing treatment and top electrode on resistive switching properties were investigated. The device with VO-deficient TiOx after annealing reduces the defects and exhibits small window and low switching currents. The device with low work function Ti top electrode provides low barrier to increase reset currents and the randomly distributed filamentary paths forms near the Ti causes wide current distribution.
引用
收藏
页码：4431 / 4434
页数：4
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