Micro-Raman study of InGaP composition grown on V-grooved substrates

被引:2
|
作者
Kicin, S [1 ]
Kromka, A
Kúdela, R
Hasenöhrl, S
Schwarz, A
Novák, J
机构
[1] Slovak Acad Sci, Inst Elect Engn, SK-84239 Bratislava, Slovakia
[2] Slovak Tech Univ Bratislava, Bratislava 81219, Slovakia
[3] Forschungszentrum Julich, Inst Schicht & Ionentech, D-52425 Julich, Germany
关键词
Raman spectroscopy; InGaP/GaAs; non-planar growth;
D O I
10.1016/j.mseb.2004.02.004
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The influence of organometalic vapour phase epitaxy (OMVPE) growth parameters on composition of non-planar InxGa1-xP along the V-groove sidewalls is carried out by micro-Raman spectroscopy. The increased incorporation of Ga atoms at the (1 1 1) sidewalls is observed compared with the (1 0 0) patterned surface facets. Contrary to the homogeneous (1 1 1) Ga-enriched InGaP layers reported for the U-grooved overgrown structures (with the (1 0 0) bottom facets) the (1 1 1) facets exhibit parts with the different InxGa1-xP composition. An uncommon feature is the width of Ga-rich bottom area (3 mum). The obtained results indicate a possibility to suppress Ga-accumulation and to improve lattice matching of overgrown structures by a proper optimisation of growth parameters. Thus, the growth of sufficiently lattice matched GaAs/InGaP structures along a whole sidewall of the V-groove could be possible. (C) 2004 published by Elsevier B.V.
引用
收藏
页码:111 / 116
页数:6
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