Electronic chemicals -: Mitsubishi gas expands H2O2

被引:0
|
作者
不详
机构
关键词
D O I
暂无
中图分类号
TQ [化学工业];
学科分类号
0817 ;
摘要
引用
收藏
页码:28 / 28
页数:1
相关论文
共 50 条
  • [1] Electronic chemicals - Merck doubles H2O2, expands HCI
    不详
    [J]. CHEMICAL WEEK, 1997, 159 (36) : 71 - 71
  • [2] Mitsubishi Gas Chemical enhances H2O2 derivatives
    不详
    [J]. JOURNAL OF SCIENTIFIC & INDUSTRIAL RESEARCH, 2000, 59 (07): : 613 - 613
  • [3] Electronic chemicals - New H2O2 suppliers?
    DAmico, E
    [J]. CHEMICAL WEEK, 1996, 158 (35) : 41 - 41
  • [4] Solvay chemicals expands H2O2 capacity in Deer Park, TX
    不详
    [J]. CHEMICAL ENGINEERING PROGRESS, 2005, 101 (03) : 13 - 13
  • [5] Electronic chemicals - Santoku Merck in Singapore H2O2
    Hunter, D
    [J]. CHEMICAL WEEK, 1997, 159 (44) : 32 - 32
  • [6] Mitsubishi plans H2O2 plant in Taiwan
    Bettenhausen, Craig
    [J]. CHEMICAL & ENGINEERING NEWS, 2020, 98 (08) : 14 - 14
  • [8] GAS AND AQUEOUS PHASE MEASUREMENTS OF H2O2
    KOK, GL
    HEIKES, BG
    LAZRUS, AL
    [J]. ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 1986, 191 : 119 - PETR
  • [9] Direct H2O2 Synthesis, without H2 Gas
    Huang, Aoxue
    Delima, Roxanna S.
    Kim, Yongwook
    Lees, Eric W.
    Parlane, Fraser G. L.
    Dvorak, David J.
    Rooney, Michael B.
    Jansonius, Ryan P.
    Fink, Arthur G.
    Zhang, Zishuai
    Berlinguette, Curtis P.
    [J]. JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 2022, 144 (32) : 14548 - 14554
  • [10] Degradation of Calmagite by H2O2/UV/US, H2O2/US, H2O2, and US process
    Menek, Necati
    Ugurlar, Ceren
    Ucarh, Okan
    Karaman, Yeliz
    Omanovic, Sasha
    Ghasemian, Saloumeh
    [J]. ALEXANDRIA ENGINEERING JOURNAL, 2022, 61 (05) : 4127 - 4135