Electron temperature and radiative attachment continua in enclosed inductively coupled plasma in argon and chlorine

Inductively coupled plasma (ICP) discharges in chlorine, argon, and their mixtures sustained inside a spherical quartz container at atmospheric pressure have been investigated. Continua of radiative attachment of a free electron to a chlorine atom in ICP are elucidated and are utilized to derive a spatial profile of electron temperature. A qualitative picture of elementary processes in enclosed ICP is given. Differences between electron and gas temperatures are discussed. Electron temperature is maximum in a periphery layer near the induction coil that is chosen for impurity determination. Concentrations of carbon and metal impurities are estimated. (C) 1997 Elsevier Science B.V.