Magnetic patterning using ion irradiation for highly ordered CoPt alloys with perpendicular anisotropy

被引：22
|
作者：
Abes, M
Venuat, J
Muller, D
Carvalho, A
Schmerber, G
Beaurepaire, E
Dinia, A
Pierron-Bohnes, V
机构：
[1] ULP, ECPM, CNRS,UMR 7504, IPCMS GEMME, F-67034 Strasbourg 2, France
[2] CNRS, UPR 292, Lab PHASE, F-67037 Strasbourg, France
来源：
JOURNAL OF APPLIED PHYSICS | 2004年 / 96卷 / 12期
关键词：
D O I：
10.1063/1.1807522
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
We used a combination of ion irradiation and e-beam lithography to magnetically pattern an ordered CoPt alloy with strong perpendicular magnetic anisotropy. Ion irradiation disorders the alloy and strongly reduces the magnetic anisotropy. Magnetic force microscopy showed a regular array of 1 mum(2) square dots with perpendicular anisotropy separated by 1 mum large ranges with in-plane anisotropy. This is further confirmed by magnetic measurements, which showed that arrays protected by a 200 nm Pt layer present the same coercive field and the same perpendicular anisotropy as before irradiation. This is promising for applications in magnetic recording technologies. (C) 2004 American Institute of Physics.
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页码：7420 / 7423
页数：4
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