A study of capacitively coupled plasma generation in single-loop antennas

被引:6
|
作者
Shindo, H
Kudo, D
Fujii, S
机构
[1] Tokai Univ, Dept Elect, Hiratsuka, Kanagawa 2591292, Japan
[2] ADTEC Plasma Technol Co Ltd, Fukuyama, Hiroshima 7210942, Japan
来源
关键词
inductively coupled plasma; capacitively coupled plasma; plasma etching; high-mode antenna; electron density;
D O I
10.1143/JJAP.41.L956
中图分类号
O59 [应用物理学];
学科分类号
摘要
A capacitively coupled plasma generation is studied in a single-loop antenna system, which is commonly used in an inductively coupled plasma production. The capacitive coupling mode appears at relatively low RF powers with two different azimuthal modes of single-loop antenna, m = 0 and m = 1. The coupling mode is confirmed by measuring change in antenna voltage per unit input power and the azimuthal distribution of electron density. The antenna voltage change is remarkably higher in the capacitive mode than in the inductive one but their values are found to be independent of the antenna modes. One of the important findings is that the transition of the capacitive to the inductive coupling plasma mode is taken place at m = I even with fairly lower antenna voltages.
引用
收藏
页码:L956 / L959
页数:4
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