Negative Radiation-Pressure Response of a Left-Handed Plasmonic Metamaterial

被引:0
|
作者
Lezec, Henri. J. [1 ]
Chau, Kenneth J. [1 ]
机构
[1] Natl Inst Stand & Technol, Ctr Nanoscale Sci & Technol, Gaithersburg, MD 20899 USA
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中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We present the design, fabrication and opto-mechanical characterization of a left-handed plasmonic metamaterial which exhibits a negative photon-pressure response ill the visible frequency range. (C)2009 Optical Society of America
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页码:3223 / 3223
页数:1
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