Epitaxial growth and anisotropic dielectric properties of La-doped Bi4Ti3O12 thin films

被引:1
|
作者
Lee, Jang-Sik [1 ]
Jia, Q. X. [2 ]
机构
[1] Kookmin Univ, Sch Adv Mat Engn, Seoul 136702, South Korea
[2] Los Alamos Natl Lab, Mat Sci & Technol Div, Los Alamos, NM 87544 USA
基金
美国能源部;
关键词
la-doped Bi4Ti3O12; anisotropic dielectric property; epitaxial growth; crystal direction;
D O I
10.4028/www.scientific.net/SSP.124-126.177
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
To investigate the anisotropic dielectric properties of layer-structured bismuth-based ferroelectrics along different crystal directions, we fabricate devices along different crystal orientations using highly c-axis oriented Bi3.25La0.75Ti3O12 (BLT) thin films on (001) LaAlO3 (LAO) substrates. Experimental results have shown that the dielectric properties of the BLT films are highly anisotropic along different crystal directions. The dielectric constants (1 MHz at 300 K) are 358 and 160 along [100] and [110], respectively, Dielectric nonlinearity is also detected along these crystal directions. On the other hand, a much smaller dielectric constant and no detectable dielectric nonlinearity in a field range of 0-200 kV/cm are observed for films along [001] when c-axis oriented SRO is used as the bottom electrode.
引用
收藏
页码:177 / +
页数:2
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